CE-ADMA-2002 - Thin Films
Course Description
In Thin Films, you’ll explore a range of topics including equipment and processes for depositing and removing thin films in IC fabricating, vacuum technology to provide controlled environments, physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma and reactive-on etch (RIE) processes, chemical mechanical planarization (CMP), and the underlying physics and chemistry. You’ll walk away from this course understanding deposition and etch processes, parameter space dependencies, how to characterize thin films, address integration challenges, and the operation of various vacuum systems.
Course Outcomes
- Understand deposition/etch processes
Knowledge of the chemistry and physics involved in deposition/etch processes - Describe parameter space dependencies
Understand and describe the parameter space dependencies associated with thin films - Characterize thin films
Describe basic techniques and metrics for characterizing thin films - Assess integration challenges
Assess the challenges of integrating a new material into an existing process - Understand vacuum system operations
Describe the operation of various vacuum systems
The Learning Experience
This asynchronous course is designed for participants from broad-ranging technical educational backgrounds, including students from various engineering and physical sciences disciplines. This course is also appropriate for early-career industry professionals, community college students and faculty, and any individual holding an AS or BS degree in a STEM field interested in a career in the vibrant semiconductor industry.
Applies Towards the Following Certificates
- Semiconductor Career Accelerator : Core Courses